发明授权
- 专利标题: Method and device for cleaning a substrate and storage medium
- 专利标题(中): 清洗基材和储存介质的方法和装置
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申请号: US13056504申请日: 2009-07-27
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公开(公告)号: US08673086B2公开(公告)日: 2014-03-18
- 发明人: Akitake Tamura , Akinobu Kakimoto , Kazuya Dobashi
- 申请人: Akitake Tamura , Akinobu Kakimoto , Kazuya Dobashi
- 申请人地址: JP Tokyo
- 专利权人: Tokyo Electron Limited
- 当前专利权人: Tokyo Electron Limited
- 当前专利权人地址: JP Tokyo
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JP2008-198586 20080731
- 国际申请: PCT/JP2009/063329 WO 20090727
- 国际公布: WO2010/013661 WO 20100204
- 主分类号: B08B7/00
- IPC分类号: B08B7/00
摘要:
In a cleaning method, a substrate having a pattern formed on the surface thereof can be cleaned by using a cleaning fluid, while preventing the pattern protrusions from being flattened when the cleaning fluid is removed or dried. The cleaning method includes the steps of: loading a substrate onto a loading platform inside a processing chamber; heating the substrate; and supplying a cleaning fluid onto the surface of the substrate. The substrate is heated in the substrate heating step so that the Leidenfrost phenomenon occurs and steam of the cleaning fluid is interposed between the substrate and droplets of the cleaning fluid supplied to the substrate in the cleaning fluid supply step.
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