发明授权
- 专利标题: Photosensitive resin composition containing copolymer
- 专利标题(中): 含有共聚物的感光树脂组合物
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申请号: US13395336申请日: 2010-08-30
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公开(公告)号: US08674043B2公开(公告)日: 2014-03-18
- 发明人: Takahiro Kishioka
- 申请人: Takahiro Kishioka
- 申请人地址: JP Tokyo
- 专利权人: Nissan Chemical Industries, Ltd.
- 当前专利权人: Nissan Chemical Industries, Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Oliff PLC
- 优先权: JP2009-212329 20090914
- 国际申请: PCT/JP2010/064717 WO 20100830
- 国际公布: WO2011/030688 WO 20110317
- 主分类号: C08F12/26
- IPC分类号: C08F12/26 ; C08F12/32 ; C08F20/52 ; C08F22/40 ; C08F220/52 ; C08F222/40
摘要:
There is provided a photosensitive resin composition having desired properties. A photosensitive resin composition comprising: a component (A) that is a copolymer including a structural unit of Formula (1) and at least one structural unit of Formula (2), and a component (B) that is a photosensitizer: (where two Xs are independently a hydrogen atom, a C1-5 alkyl group, a C5-6 cycloalkyl group, a phenyl group, or a benzyl group and Y is a hydrogen atom, a C1-5 alkyl group, a C5-6 cycloalkyl group, a phenyl group, or a benzyl group provided that each of a part or all of the hydrogen atoms in the alkyl group, the cycloalkyl group, the phenyl group, and the benzyl group is optionally substituted with a halogen atom, a carboxy group, a hydroxy group, an amino group, or a nitro group).
公开/授权文献
- US20120172557A1 PHOTOSENSITIVE RESIN COMPOSITION CONTAINING COPOLYMER 公开/授权日:2012-07-05
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