Invention Grant
- Patent Title: Diode having high brightness and method thereof
- Patent Title (中): 具有高亮度的二极管及其方法
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Application No.: US13074566Application Date: 2011-03-29
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Publication No.: US08674386B2Publication Date: 2014-03-18
- Inventor: Myung Cheol Yoo
- Applicant: Myung Cheol Yoo
- Applicant Address: KR Seoul
- Assignee: LG Innotek Co. Ltd.
- Current Assignee: LG Innotek Co. Ltd.
- Current Assignee Address: KR Seoul
- Agency: McKenna Long & Aldridge LLP
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A light emitting diode includes a transparent substrate and a GaN buffer layer on the transparent substrate. An n-GaN layer is formed on the buffer layer. An active layer is formed on the n-GaN layer. A p-GaN layer is formed on the active layer. A p-electrode is formed on the p-GaN layer and an n-electrode is formed on the n-GaN layer. A reflective layer is formed on a second side of the transparent substrate. Also, a cladding layer of AlGaN is between the p-GaN layer and the active layer.
Public/Granted literature
- US20110220948A1 DIODE HAVING HIGH BRIGHTNESS AND METHOD THEREOF Public/Granted day:2011-09-15
Information query
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