发明授权
- 专利标题: Mask inspection apparatus and mask inspection method
- 专利标题(中): 面膜检查仪和面膜检查方法
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申请号: US13066180申请日: 2011-04-07
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公开(公告)号: US08675948B2公开(公告)日: 2014-03-18
- 发明人: Yoshiaki Ogiso , Tsutomu Murakawa
- 申请人: Yoshiaki Ogiso , Tsutomu Murakawa
- 申请人地址: JP Tokyo
- 专利权人: Advantest Corp.
- 当前专利权人: Advantest Corp.
- 当前专利权人地址: JP Tokyo
- 代理机构: Muramatsu & Associates
- 优先权: JP2010-091556 20100412
- 主分类号: G06K9/00
- IPC分类号: G06K9/00
摘要:
A mask inspection apparatus includes irradiation means for irradiating a sample with an electron beam, electron detection means for detecting a quantity of electrons generated from the sample having a pattern formed thereon by the irradiation with the electron beam, image processing means for generating image data of the pattern on the basis of the quantity of the electrons, and control means for creating a line profile and a differential profile of the pattern formed on the sample on the basis of the quantity of the electrons detected by the electron detection means. The control means detects a rising edge and a falling edge of the pattern on the basis of the differential profile, and then generates mask data of a multi-level structure on the basis of data of the edges and the image data created by the image processing means.
公开/授权文献
- US20110249108A1 Mask inspection apparatus and mask inspection method 公开/授权日:2011-10-13