发明授权
- 专利标题: Double patterning compatible colorless M1 route
- 专利标题(中): 双重图案化兼容无色M1路线
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申请号: US13646760申请日: 2012-10-08
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公开(公告)号: US08677291B1公开(公告)日: 2014-03-18
- 发明人: Lei Yuan , Jongwook Kye , Mahbub Rashed , Qinglei Wang
- 申请人: Lei Yuan , Jongwook Kye , Mahbub Rashed , Qinglei Wang
- 申请人地址: KY Grand Cayman
- 专利权人: GlobalFoundries Inc.
- 当前专利权人: GlobalFoundries Inc.
- 当前专利权人地址: KY Grand Cayman
- 代理机构: Ditthavong Mori & Steiner, P.C.
- 主分类号: G06F17/50
- IPC分类号: G06F17/50
摘要:
A method for enabling functionality in circuit designs utilizing colorless DPT M1 route placement that maintains high routing efficiency and guarantees M1 decomposability of a target pattern and the resulting circuit are disclosed. Embodiments include: determining a boundary abutting first and second cells in an IC; determining a side of a first edge pin in the first cell facing a side of a second edge pin in the second cell; determining a first vertical segment of at least a portion of the side of the first edge pin and a second vertical segment of at least a portion of the side of the second edge pin; designating an area between the first vertical segment and the boundary as a first portion of a routing zone; and designating an area between the second vertical segment and the boundary as a second portion of the routing zone.
公开/授权文献
- US20140097892A1 DOUBLE PATTERNING COMPATIBLE COLORLESS M1 ROUTE 公开/授权日:2014-04-10
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