Invention Grant
US08679895B2 Method of making thin-wafer current sensors 有权
制造薄片电流传感器的方法

Method of making thin-wafer current sensors
Abstract:
Embodiments relate to IC current sensors fabricated using thin-wafer manufacturing technologies. Such technologies can include processing in which dicing before grinding (DBG) is utilized, which can improve reliability and minimize stress effects. While embodiments utilize face-up mounting, face-down mounting is made possible in other embodiments by via through-contacts. IC current sensor embodiments can present many advantages while minimizing drawbacks often associated with conventional IC current sensors.
Public/Granted literature
Information query
Patent Agency Ranking
0/0