发明授权
US08680296B2 Leaving substituent-containing compound, products produced using the same, and methods for producing the products
有权
离开含取代基的化合物，使用其制备的产物，以及制备该产品的方法
- 专利标题： Leaving substituent-containing compound, products produced using the same, and methods for producing the products
- 专利标题（中）： 离开含取代基的化合物，使用其制备的产物，以及制备该产品的方法
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申请号： US13391448申请日： 2010-09-09
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公开(公告)号： US08680296B2公开(公告)日： 2014-03-25
- 发明人: Daisuke Goto , Satoshi Yamamoto , Toshiya Sagisaka , Takuji Kato , Takashi Okada , Masato Shinoda , Shinji Matsumoto , Masataka Mohri , Keiichiro Yutani
- 申请人： Daisuke Goto , Satoshi Yamamoto , Toshiya Sagisaka , Takuji Kato , Takashi Okada , Masato Shinoda , Shinji Matsumoto , Masataka Mohri , Keiichiro Yutani
- 申请人地址： JP Tokyo
- 专利权人： Ricoh Company, Ltd.
- 当前专利权人： Ricoh Company, Ltd.
- 当前专利权人地址： JP Tokyo
- 代理机构： Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 优先权： JP2009-209911 20090911; JP2010-004324 20100112; JP2010-061591 20100317; JP2010-162750 20100720; JP2010-163865 20100721
- 国际申请： PCT/JP2010/065996 WO 20100909
- 国际公布： WO2011/030918 WO 20110317
- 主分类号： C07D495/02
- IPC分类号： C07D495/02 ; H01J1/62
摘要：
A leaving substituent-containing compound including a partial structure represented by the following General Formula (I): where a pair of X1 and X2 or a pair of Y1 and Y2 each represent a hydrogen atom; the other pair each represent a group selected from the group consisting of a halogen atom and a substituted or unsubstituted acyloxy group having one or more carbon atoms; a pair of the acyloxy groups represented by the pair of X1 and X2 or the pair of Y1 and Y2 may be identical or different, or may be bonded together to form a ring; R1 to R4 each represent a hydrogen atom or a substituent; and Q1 and Q2 each represent a hydrogen atom, a halogen atom or a monovalent organic group, and may be bonded together to form a ring.
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