发明授权
- 专利标题: Radiation conduit for radiation source
- 专利标题(中): 辐射源辐射管
-
申请号: US13489096申请日: 2012-06-05
-
公开(公告)号: US08680493B2公开(公告)日: 2014-03-25
- 发明人: Maikel Adrianus Cornelis Schepers , Markus Franciscus Antonius Eurlings , Franciscus Johannes Joseph Janssen , Bernard Jacob Andries Stommen , Hrishikesh Patel , Hermanus Johannes Maria Kreuwel , Jacob Cohen , Pepijn Wijnand Jozef Janssen , Maarten Kees Jan Boon
- 申请人: Maikel Adrianus Cornelis Schepers , Markus Franciscus Antonius Eurlings , Franciscus Johannes Joseph Janssen , Bernard Jacob Andries Stommen , Hrishikesh Patel , Hermanus Johannes Maria Kreuwel , Jacob Cohen , Pepijn Wijnand Jozef Janssen , Maarten Kees Jan Boon
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 代理机构: Pillsbury Winthrop Shaw Pittman LLP
- 主分类号: G01J3/10
- IPC分类号: G01J3/10
摘要:
A radiation source includes a fuel supply configured to deliver fuel to a plasma emission location for vaporization by a laser beam to form a plasma, and a collector configured to collect EUV radiation emitted by the plasma and direct the EUV radiation towards an intermediate focus. The collector includes a diffraction grating configured to diffract infrared radiation emitted by the plasma. The radiation source includes a radiation conduit located in between the collector and the intermediate focus. The radiation conduit includes an entrance aperture connected by an inwardly tapering body to an exit aperture. The radiation conduit includes an inner portion and an outer portion, the inner portion being closer to the intermediate focus than the outer portion. The inner portion is configured to reflect incident diffracted infrared radiation towards the outer portion.
公开/授权文献
- US20130001442A1 RADIATION SOURCE AND LITHOGRAPHIC APPARATUS 公开/授权日:2013-01-03
信息查询