发明授权
- 专利标题: Electronic device and method of manufacturing the same
- 专利标题(中): 电子设备及其制造方法
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申请号: US11856730申请日: 2007-09-18
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公开(公告)号: US08685796B2公开(公告)日: 2014-04-01
- 发明人: Yoichiro Kurita , Koji Soejima , Masaya Kawano
- 申请人: Yoichiro Kurita , Koji Soejima , Masaya Kawano
- 申请人地址: JP Kanagawa
- 专利权人: Renesas Electronics Corporation
- 当前专利权人: Renesas Electronics Corporation
- 当前专利权人地址: JP Kanagawa
- 代理机构: Young & Thompson
- 优先权: JP2006-271164 20061002
- 主分类号: H01L21/44
- IPC分类号: H01L21/44
摘要:
The electronic device includes a first interconnect layer and a second interconnect layer. The second interconnect layer is provided on the lower surface of the first interconnect layer. The first interconnect layer includes a via plug (first conductive plug). An end face of the via plug on the side of the second interconnect layer is smaller in area than the opposite end face. The via plug is exposed on the surface of the first interconnect layer facing the second interconnect layer. An insulating resin forming the first interconnect layer is higher in thermal decomposition temperature than an insulating resin forming the second interconnect layer.
公开/授权文献
- US20080079157A1 ELECTRONIC DEVICE AND METHOD OF MANUFACTURING THE SAME 公开/授权日:2008-04-03
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