Invention Grant
US08688254B2 Multiple tools using a single data processing unit 有权
使用单个数据处理单元的多种工具

Multiple tools using a single data processing unit
Abstract:
A method and system for simultaneously processing multiple substrates through an imaging beam process is provided. The system includes a plurality of direct write substrate exposure modules configured to receive a writing instruction from a data processing unit. The system and method of the invention utilizes multiple exposure modules receiving writing instructions from a single common data processing unit.
Public/Granted literature
Information query
Patent Agency Ranking
0/0