APPARATUS FOR PROCESSING SUBSTRATE
    1.
    发明公开

    公开(公告)号:US20240017284A1

    公开(公告)日:2024-01-18

    申请号:US18138038

    申请日:2023-04-22

    CPC classification number: B05C9/08

    Abstract: An apparatus for processing a substrate includes a processing vessel disposed in a process chamber and including a processing space in which a substrate is accommodated; a liquid supply line configured to process the substrate by supplying processing liquid to the substrate in the processing space; an exhaust line connected to the processing vessel and configured to exhaust gas in the processing space; a spraying portion disposed on the exhaust line and configured to spray cleaning liquid to remove contaminants accumulated in the exhaust line; and a washing liquid discharge line branched from the exhaust line and including a suction portion therein to suction cleaning liquid waste including contaminants removed from the exhaust line by the cleaning liquid and to discharge the cleaning liquid waste to the outside.

    Imprint apparatus, and product manufacturing method

    公开(公告)号:US11664225B2

    公开(公告)日:2023-05-30

    申请号:US16245124

    申请日:2019-01-10

    Inventor: Jun Ota

    Abstract: An imprint apparatus forms imprint material using a mold on a substrate. The imprint apparatus includes a movable stage configured to hold the substrate, a supply portion configured to discharge the imprint material, and a control unit configured to cause the supply portion to discharge the imprint material while moving the stage so that the imprint material is supplied onto the substrate. The control unit controls discharge of the imprint material from the supply portion so that a target amount of the imprint material is arranged at a target position on the substrate, based on property information indicating a relation between a discharge amount of imprint material from the supply portion and a position on a target object where the imprint material is to be arranged.

    Imprint apparatus, imprint method, and method of manufacturing article

    公开(公告)号:US11333971B2

    公开(公告)日:2022-05-17

    申请号:US16408586

    申请日:2019-05-10

    Inventor: Kazuki Nakagawa

    Abstract: There is provided that an imprint apparatus that forms a pattern on a substrate by curing an imprint material in a state in which a mold and the imprint material on the substrate are in contact with each other, the apparatus including a control unit configured to control a movement of a stage configured to hold the substrate and the supplying of a gas by a gas supplying unit, wherein the control unit removes charges from the mold by starting the supplying of the gas by the gas supplying unit before starting to move the stage below a dispenser after the mold and the cured imprint material are separated, and making a peripheral member face the mold via the gas during the movement of the stage.

    Device and method for dynamic metering of sealing compounds

    公开(公告)号:US11059070B2

    公开(公告)日:2021-07-13

    申请号:US16332919

    申请日:2017-09-05

    Applicant: CHEMETALL GMBH

    Inventor: Heinz Burock

    Abstract: Described herein is an apparatus for dynamic metering of sealant volumes, and also described herein is a corresponding method.
    The apparatus of the invention includes two containers for sealant components; a first drive, which is connected to two devices, each of which is able to convey one of the sealant components from its container; a drive controller; a mixing unit for mixing the sealant components conveyed from the containers, having an opening for applying the sealant to a component; and also, additionally, a compensating container with a compensating volume; and a second drive, which is connected to a piston which reaches into the compensating volume of the compensating container.
    The compensating container in this arrangement is connected to the mixing unit. The first drive and the second drive can be dynamically controlled jointly by the drive controller.

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