Invention Grant
- Patent Title: Attenuated phase shift mask for multi-patterning
- Patent Title (中): 用于多图案化的衰减相移掩模
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Application No.: US13607823Application Date: 2012-09-10
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Publication No.: US08691478B2Publication Date: 2014-04-08
- Inventor: Frederick T. Chen
- Applicant: Frederick T. Chen
- Applicant Address: TW Hsinchu
- Assignee: Industrial Technology Research Institute
- Current Assignee: Industrial Technology Research Institute
- Current Assignee Address: TW Hsinchu
- Agency: Jianq Chyun IP Office
- Main IPC: G03F1/32
- IPC: G03F1/32

Abstract:
An attenuated phase shift mask (AttPSM) is fabricated with a set of fully transmitting regions, some parts adjacent phase-shifting regions with a first reduced transmission and first phase shift near 180 degrees, and remaining parts adjacent phase-shifting regions with a second transmission higher than the first transmission and second phase shift lower than the first phase shift.
Public/Granted literature
- US20140072902A1 ATTENUATED PHASE SHIFT MASK FOR MULTI-PATTERNING Public/Granted day:2014-03-13
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