发明授权
- 专利标题： Developing treatment method
- 专利标题（中）： 开发治疗方法
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申请号： US13499362申请日： 2010-08-20
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公开(公告)号： US08691497B2公开(公告)日： 2014-04-08
- 发明人: Yuichiro Inatomi , Mitsuaki Iwashita
- 申请人： Yuichiro Inatomi , Mitsuaki Iwashita
- 申请人地址： JP Tokyo
- 专利权人： Tokyo Electron Limited
- 当前专利权人： Tokyo Electron Limited
- 当前专利权人地址： JP Tokyo
- 代理机构： Posz Law Group, PLC
- 优先权： JP2009-230642 20091002
- 国际申请： PCT/JP2010/064038 WO 20100820
- 国际公布： WO2011/040140 WO 20110407
- 主分类号： G03F7/40
- IPC分类号： G03F7/40
摘要：
A developing treatment method includes: a treatment solution supplying step of supplying a treatment solution made by diluting a hydrophobizing agent hydrophobizing a resist pattern with hydrofluoroether onto a substrate on which a rinse solution has been supplied after development of the resist pattern; a hydrophobic treatment stabilizing step of stabilizing a hydrophobic treatment of the resist pattern with the supply of the treatment solution stopped and rotation of the substrate almost stopped; and a treatment solution removing step of removing the treatment solution from a top of the substrate on which the treatment solution has been supplied. The hydrophobizing agent is trimethylsilyldimethyl-amine.
公开/授权文献
- US20120183909A1 DEVELOPING TREATMENT METHOD 公开/授权日：2012-07-19
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