Invention Grant
- Patent Title: Integrated circuit connector access region
- Patent Title (中): 集成电路连接器接入区域
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Application No.: US13594372Application Date: 2012-08-24
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Publication No.: US08692379B2Publication Date: 2014-04-08
- Inventor: Shih-Hung Chen
- Applicant: Shih-Hung Chen
- Applicant Address: TW Hsinchu
- Assignee: Macronix International Co., Ltd.
- Current Assignee: Macronix International Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Haynes Beffel & Wolfeld LLP
- Agent James F. Hann
- Main IPC: H01L23/50
- IPC: H01L23/50

Abstract:
A connector access region of an integrated circuit device includes a set of parallel conductors, extending in a first direction, and interlayer connectors. The conductors comprise a set of electrically conductive contact areas on different conductors which define a contact plane with the conductors extending below the contact plane. A set of the contact areas define a line at an oblique angle, such as less than 45° or 5° to 27°, to the first direction. The interlayer connectors are in electrical contact with the contact areas and extend above the contact plane. At least some of the interlayer connectors overlie but are electrically isolated from the electrical conductors adjacent to the contact areas with which the interlayer connectors are in electrical contact. The set of parallel conductors may include a set of electrically conductive layers with the contact plane being generally perpendicular to the electrically conductive layers.
Public/Granted literature
- US20140054784A1 Integrated Circuit Connector Access Region and Method for Making Public/Granted day:2014-02-27
Information query
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