发明授权
- 专利标题: Apparatus and methods for vacuum-compatible substrate thermal management
- 专利标题(中): 真空兼容基板热管理的设备和方法
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申请号: US12875720申请日: 2010-09-03
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公开(公告)号: US08693856B2公开(公告)日: 2014-04-08
- 发明人: Jason Keith Rowan , Li-Min Chen , Roni Robinzon , Christopher Vreje Ohanian
- 申请人: Jason Keith Rowan , Li-Min Chen , Roni Robinzon , Christopher Vreje Ohanian
- 申请人地址: US CA Milpitas
- 专利权人: KLA-Tencor Corporation
- 当前专利权人: KLA-Tencor Corporation
- 当前专利权人地址: US CA Milpitas
- 代理机构: Okamoto & Benedicto LLP
- 主分类号: F24H1/34
- IPC分类号: F24H1/34
摘要:
One embodiment relates to an apparatus for vacuum-compatible substrate thermal management. The apparatus includes a load-lock chamber coupled to a vacuum chamber, a light-emitting diode array, and a substrate stage. The load-lock chamber is configured to hold a substrate prior to the substrate being transferred into the vacuum chamber, and a substrate stage is configured to hold the substrate in the vacuum chamber. The light-emitting diode array is configured to warm the substrate while the substrate is in the load-lock chamber. Other features, aspects and embodiments are also disclosed.
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