发明授权
- 专利标题: Thin film deposition apparatus
- 专利标题(中): 薄膜沉积装置
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申请号: US12873689申请日: 2010-09-01
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公开(公告)号: US08696815B2公开(公告)日: 2014-04-15
- 发明人: Young-Mook Choi , Chang-Mog Jo , Hee-Cheol Kang , Hyun-Sook Park
- 申请人: Young-Mook Choi , Chang-Mog Jo , Hee-Cheol Kang , Hyun-Sook Park
- 申请人地址: KR Yongin-si
- 专利权人: Samsung Display Co., Ltd.
- 当前专利权人: Samsung Display Co., Ltd.
- 当前专利权人地址: KR Yongin-si
- 代理机构: Christie, Parker & Hale, LLP
- 优先权: KR10-2009-0081979 20090901; KR10-2010-0014276 20100217
- 主分类号: C23C16/00
- IPC分类号: C23C16/00
摘要:
A thin film deposition apparatus that forms a thin film on a substrate includes: a deposition source that discharges a deposition material; a deposition source nozzle unit that is disposed at a side of the deposition source and includes a plurality of deposition source nozzles; a patterning slit sheet that is disposed opposite to the deposition source nozzle unit and includes a plurality of patterning slits; and a blocking member that is disposed between the substrate and the deposition source, wherein the thin film deposition apparatus is separated from the substrate by a predetermined distance, the substrate is moved relative to the thin film deposition apparatus, and the blocking member is moved along with the substrate to screen at least one portion of the substrate.
公开/授权文献
- US20110048320A1 THIN FILM DEPOSITION APPARATUS 公开/授权日:2011-03-03
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