Invention Grant
- Patent Title: Photolithographic methods
- Patent Title (中): 光刻方法
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Application No.: US13607729Application Date: 2012-09-09
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Publication No.: US08697338B2Publication Date: 2014-04-15
- Inventor: Young Cheol Bae , Rosemary Bell , Jong Keun Park , Seung-Hyun Lee
- Applicant: Young Cheol Bae , Rosemary Bell , Jong Keun Park , Seung-Hyun Lee
- Applicant Address: US MA Marlborough
- Assignee: Rohm and Haas Electronics Materials LLC
- Current Assignee: Rohm and Haas Electronics Materials LLC
- Current Assignee Address: US MA Marlborough
- Agent Jonathan D. Baskin
- Main IPC: G03F7/26
- IPC: G03F7/26
Abstract:
Provided are photoresist overcoat compositions, substrates coated with the overcoat compositions and methods of forming electronic devices by a negative tone development process. The compositions, coated substrates and methods find particular applicability in the manufacture of semiconductor devices.
Public/Granted literature
- US20130244438A1 PHOTOLITHOGRAPHIC METHODS Public/Granted day:2013-09-19
Information query
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