Invention Grant
- Patent Title: Thin film transistor substrate and method for fabricating the same
- Patent Title (中): 薄膜晶体管基板及其制造方法
-
Application No.: US13328094Application Date: 2011-12-16
-
Publication No.: US08697535B2Publication Date: 2014-04-15
- Inventor: Tae-Jin Kim , Sang-Jae Yeo , Dae-Sung Choi
- Applicant: Tae-Jin Kim , Sang-Jae Yeo , Dae-Sung Choi
- Applicant Address: KR Yongin, Gyeonggi-Do
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Yongin, Gyeonggi-Do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2011-0081738 20110817
- Main IPC: H01L21/76
- IPC: H01L21/76

Abstract:
A thin film transistor substrate includes a substrate, a gate electrode on the substrate, an active layer on or below the gate electrode (the active layer at least partially overlapping the gate electrode) including a first active region and a second active region, the first active region and the second active region facing each other and extending beyond the gate electrode, a source electrode electrically connected to the first active region and a drain electrode electrically connected to the second active region, wherein the active layer includes a recess region which is at least partially recessed from a surface of the active layer facing the gate electrode, and the recess region includes a portion extending between the first active region and the second active region.
Public/Granted literature
- US20130043479A1 THIN FILM TRANSISTOR SUBSTRATE AND METHOD FOR FABRICATING THE SAME Public/Granted day:2013-02-21
Information query
IPC分类: