Invention Grant
- Patent Title: Extreme ultraviolet light source device, laser light source device for extreme ultraviolet light source, and method of adjusting laser light source device for extreme ultraviolet light source device
- Patent Title (中): 极紫外光源装置,极紫外光源用激光光源装置及极紫外光源装置的激光光源装置调整方法
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Application No.: US13759970Application Date: 2013-02-05
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Publication No.: US08698114B2Publication Date: 2014-04-15
- Inventor: Masato Moriya , Hideo Hoshino , Hakaru Mizoguchi , Osamu Wakabayashi
- Applicant: Gigaphoton Inc.
- Applicant Address: JP Tochigi
- Assignee: Gigaphoton Inc.
- Current Assignee: Gigaphoton Inc.
- Current Assignee Address: JP Tochigi
- Agency: McDermott Will & Emery LLP
- Priority: JP2008-240915 20080919; JP2009-008001 20090116; JP2009-212003 20090914
- Main IPC: G21K5/00
- IPC: G21K5/00

Abstract:
An EUV light source device properly compensates the wave front of laser beam which is changed by heat. A wave front compensator and a sensor are provided in an amplification system which amplifies laser beam. The sensor detects and outputs changes in the angle (direction) of laser beam and the curvature of the wave front thereof. A wave front compensation controller outputs a signal to the wave front compensator based on the measurement results from the sensor. The wave front compensator corrects the wave front of the laser beam to a predetermined wave front according to an instruction from the wave front compensation controller.
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