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公开(公告)号：US11079686B2
公开(公告)日：2021-08-03
申请号：US16871758
申请日：2020-05-11
申请人： Gigaphoton Inc.
摘要： An excimer laser apparatus according to the present disclosure includes an etalon spectrometer configured to measure a fringe waveform of a laser beam; and a controller configured to obtain area of a first ratio in a spectral space obtained based on a result of the measurement by the etalon spectrometer, calculate a first spectral line width of the laser beam based on the obtained area of the first ratio, and calibrate a first spectral line width based on a correlation function representing correlation between the first spectral line width and a second spectral line width of the laser beam measured by a reference meter.
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公开(公告)号：US09894743B2
公开(公告)日：2018-02-13
申请号：US14984458
申请日：2015-12-30
申请人： GIGAPHOTON INC.
发明人： Yukio Watanabe , Miwa Igarashi , Masato Moriya , Hiroaki Nakarai
CPC分类号： H05G2/008 , G03F7/70033 , H05G2/003
摘要： An apparatus for generating extreme ultraviolet light may include: a chamber having an opening through which a laser beam is introduced into the chamber; a reference member on which the chamber is mounted; a target supply unit for supplying a target material to be irradiated by the laser beam to a predetermined region inside the chamber; a laser beam focusing optical system for focusing the laser beam in the predetermined region inside the chamber to turn the target material into plasma; and a collector mirror for collecting the extreme ultraviolet light emitted from the plasma.
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3.发明授权公开(公告)号：US08698114B2
公开(公告)日：2014-04-15
申请号：US13759970
申请日：2013-02-05
申请人： Gigaphoton Inc.
IPC分类号： G21K5/00
CPC分类号： H01S3/10 , H01S3/005 , H01S3/0064 , H01S3/034 , H01S3/1061 , H01S3/1307 , H01S3/136 , H01S3/2232 , H01S3/2316 , H05G2/003 , H05G2/005 , H05G2/008
摘要： An EUV light source device properly compensates the wave front of laser beam which is changed by heat. A wave front compensator and a sensor are provided in an amplification system which amplifies laser beam. The sensor detects and outputs changes in the angle (direction) of laser beam and the curvature of the wave front thereof. A wave front compensation controller outputs a signal to the wave front compensator based on the measurement results from the sensor. The wave front compensator corrects the wave front of the laser beam to a predetermined wave front according to an instruction from the wave front compensation controller.
摘要翻译： EUV光源装置适当地补偿由热量改变的激光束的波前。 在放大激光束的放大系统中提供波前补偿器和传感器。 传感器检测并输出激光束的角度（方向）和其波前的曲率的变化。 波前补偿控制器根据传感器的测量结果向波前补偿器输出信号。 波前补偿器根据波前补偿控制器的指令将激光束的波前校正到预定的波前。
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公开(公告)号：US10027084B2
公开(公告)日：2018-07-17
申请号：US15076977
申请日：2016-03-22
申请人： GIGAPHOTON INC.
发明人： Masato Moriya , Osamu Wakabayashi
摘要： An alignment system for a laser apparatus includes a guide laser device outputting a guide laser beam, an adjusting mechanism adjusting travel directions of the guide laser beam and a laser beam from the laser apparatus, a beam path combiner controlling travel directions of the laser beam and the guide laser beam to substantially coincide with each other, a first optical detection unit provided from the beam path combiner detecting the laser and guide laser beams, a first controller controlling the adjusting mechanism based on a first optical detection unit detection result, a beam steering unit downstream from the beam path combiner controlling travel directions of the laser and guide laser beams, a second optical detection unit downstream from the beam steering unit detecting the guide laser beam, and a second controller controlling the beam steering unit based on a second optical detection unit detection result.
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公开(公告)号：US09835495B2
公开(公告)日：2017-12-05
申请号：US14947335
申请日：2015-11-20
申请人： Gigaphoton Inc.
IPC分类号： G01J11/00 , H01S3/134 , H01S3/00 , G01J1/42 , G01J1/04 , G01J4/04 , G02B5/30 , G02B27/14 , H01S3/23
CPC分类号： G01J11/00 , G01J1/0414 , G01J1/0429 , G01J1/0477 , G01J1/4257 , G01J4/04 , G01J2001/4261 , G02B5/3066 , G02B27/148 , H01S3/0014 , H01S3/134 , H01S3/2366
摘要： A light beam measurement device includes: a polarization measurement unit including a first measurement beam splitter provided on an optical path of a laser beam and configured to measure a polarization state of the laser beam having been partially reflected by the first measurement beam splitter; a beam profile measurement unit including a second measurement beam splitter provided on the optical path of the laser beam and configured to measure a beam profile of the laser beam having been partially reflected by the second measurement beam splitter; and a laser beam-directional stability measurement unit configured to measure a stability in a traveling direction of the laser beam, while the first measurement beam splitter and the second measurement beam splitter are made of a material containing CaF2.
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公开(公告)号：US09184551B2
公开(公告)日：2015-11-10
申请号：US14454494
申请日：2014-08-07
申请人： GIGAPHOTON INC.
CPC分类号： H01S3/10 , H01S3/005 , H01S3/0971 , H01S3/10007 , H01S3/10023 , H01S3/1003 , H01S3/104 , H01S3/13 , H01S3/1301 , H01S3/1305 , H01S3/134 , H01S3/2308 , H01S3/2316 , H01S3/2325 , H01S3/2391 , H05G2/008
摘要： A laser apparatus may include a master oscillator, an optical unit provided in a beam path of a laser beam from the master oscillator, a beam adjusting unit provided upstream from the optical unit in a beam path of the laser beam and configured for adjusting at least one of a beam path and a wavefront of the laser beam, a first detection unit provided between the beam adjusting unit and the optical unit in a beam path of the laser beam and configured for detecting the laser beam, a second detection unit provided downstream from the optical unit in a beam path of the laser beam and configured for detecting the laser beam, and a controller configured for controlling the beam adjusting unit based on outputs from the first and second detection units.
摘要翻译： 激光装置可以包括主振荡器，设置在来自主振荡器的激光束的光束路径中的光学单元，光束调节单元，其设置在激光束的光束路径中的光学单元的上游，并被配置为至少调节 激光束的光束路径和波前的一个;第一检测单元，设置在激光束的光束路径中的光束调整单元和光学单元之间，并且被配置为检测激光束;第二检测单元， 激光束的光束路径中的光学单元，被配置为检测激光束;以及控制器，被配置为基于来自第一和第二检测单元的输出来控制光束调整单元。
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公开(公告)号：US08957356B2
公开(公告)日：2015-02-17
申请号：US13662264
申请日：2012-10-26
申请人： Gigaphoton Inc.
发明人： Masato Moriya , Osamu Wakabayashi
CPC分类号： G01J1/4257 , G01J1/0429 , G01J1/429 , G01J1/44 , G01J9/00 , G03F7/70258 , H05G2/005 , H05G2/006 , H05G2/008
摘要： A system for generating extreme ultraviolet light may include a chamber, a target supply device configured to supply a target material into the chamber, a laser apparatus configured to output a laser beam to irradiate the target material, a wavefront adjuster configured to adjust a wavefront of the laser beam, an imaging optical system configured to focus the laser beam reflected by the target material, an image detector configured to capture an image of the laser beam focused by the imaging optical system, and a controller configured to control the wavefront adjuster based on the captured image.
摘要翻译： 一种用于产生极紫外光的系统可以包括：室，被配置成将目标材料供应到所述室中的目标供应装置，被配置为输出激光束以照射所述目标材料的激光装置;波前调整器， 所述激光束，被配置为聚焦由所述目标材料反射的激光束的成像光学系统;被配置为捕获由所述成像光学系统聚焦的所述激光束的图像的图像检测器;以及控制器，被配置为基于 捕获的图像。
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公开(公告)号：US10890484B2
公开(公告)日：2021-01-12
申请号：US16150298
申请日：2018-10-03
申请人： Gigaphoton Inc.
发明人： Masato Moriya
IPC分类号： G01J3/26 , H01S3/139 , G01J3/02 , G01J1/42 , H01S3/137 , G03F7/20 , H01S3/0971 , H01S3/08 , H01S3/225 , H01S3/00
摘要： A wavelength measuring device configured to detect a wavelength of ultraviolet laser light outputted from a laser resonator with at least one etalon, the wavelength measuring device includes: a first housing having an interior space being sealed and accommodating the etalon, an input window through which the ultraviolet laser light enters to the first housing, the input window being provided at a first opening of the first housing, a first sealing member configured to seal a gap between a rim part of the input window and a circumferential portion of the first opening, a shielding film provided between the rim part of the input window and the first sealing member and configured to shield the first sealing member from the ultraviolet laser light coming from the input window, and a diffusing element provided outside of the first housing and configured to diffuse the ultraviolet laser light before being incident on the input window.
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公开(公告)号：US10151640B2
公开(公告)日：2018-12-11
申请号：US15800329
申请日：2017-11-01
申请人： Gigaphoton Inc.
IPC分类号： G01J11/00 , H01S3/134 , G02B27/14 , G02B5/30 , G01J4/04 , H01S3/00 , G01J1/04 , G01J1/42 , H01S3/23
摘要： A light beam measurement device includes: a polarization measurement unit including a first measurement beam splitter provided on an optical path of a laser beam and configured to measure a polarization state of the laser beam having been partially reflected by the first measurement beam splitter; a beam profile measurement unit including a second measurement beam splitter provided on the optical path of the laser beam and configured to measure a beam profile of the laser beam having been partially reflected by the second measurement beam splitter; and a laser beam-directional stability measurement unit configured to measure a stability in a traveling direction of the laser beam, while the first measurement beam splitter and the second measurement beam splitter are made of a material containing CaF2.
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10.发明授权Method for generating extreme ultraviolet light and device for generating extreme ultraviolet light 有权用于产生极紫外光的方法和用于产生极紫外光的装置公开(公告)号：US09277635B2
公开(公告)日：2016-03-01
申请号：US14643782
申请日：2015-03-10
申请人： GIGAPHOTON INC.
IPC分类号： H01G2/00 , H05G2/00 , H01J37/22 , H01J37/304
CPC分类号： H05G2/008 , H01J37/228 , H01J37/3045 , H01J2237/20292 , H05G2/005 , H05G2/006
摘要： An extreme ultraviolet light generation device may comprise: a chamber provided with a through-hole; an introduction optical system configured to introduce the pulse laser beam into a first predetermined region inside the chamber through the through-hole; a target supply device configured to output the target toward the first predetermined region; a light source configured to irradiate a second predetermined region with light whose optical path in the second predetermined region has a transverse section that is longer along a direction perpendicular to a direction of movement of the target than along the direction of movement of the target, the second predetermined region including part of a trajectory of the target between the target supply device and the first predetermined region; and an optical sensor configured to detect light incident on the optical sensor from the second predetermined region to detect the target passing through the second predetermined region.
摘要翻译： 极紫外线发生装置可以包括：设置有通孔的室; 导入光学系统，被配置为通过所述通孔将所述脉冲激光束引入所述腔室内的第一预定区域; 目标供给装置，被配置为朝向所述第一预定区域输出所述目标; 光源，被配置为用第二预定区域的光线照射第二预定区域中的光路，沿着与目标的移动方向垂直的方向的垂直于目标的移动方向的横向部分具有横向部分， 所述第二预定区域包括所述目标供给装置和所述第一预定区域之间的所述目标的轨迹的一部分; 以及光学传感器，被配置为从所述第二预定区域检测入射在所述光学传感器上的光，以检测通过所述第二预定区域的目标。
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