Invention Grant
- Patent Title: Laminating system
- Patent Title (中): 复合系统
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Application No.: US12403988Application Date: 2009-03-13
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Publication No.: US08698156B2Publication Date: 2014-04-15
- Inventor: Ryosuke Watanabe , Hidekazu Takahashi , Takuya Tsurume
- Applicant: Ryosuke Watanabe , Hidekazu Takahashi , Takuya Tsurume
- Applicant Address: JP Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Kanagawa-ken
- Agency: Nixon Peabody LLP
- Agent Jeffrey L. Costellia
- Priority: JP2004-165104 20040602
- Main IPC: H01L29/12
- IPC: H01L29/12 ; H01L29/786 ; H01L23/31

Abstract:
It is an object of the invention to improve the production efficiency in sealing a thin film integrated circuit and to prevent the damage and break. Further, it is another object of the invention to prevent a thin film integrated circuit from being damaged in shipment and to make it easier to handle the thin film integrated circuit. The invention provides a laminating system in which rollers are used for supplying a substrate for sealing, receiving IC chips, separating, and sealing. The separation, sealing, and reception of a plurality of thin film integrated circuits can be carried out continuously by rotating the rollers; thus, the production efficiency can be extremely improved. Further, the thin film integrated circuits can be easily sealed since a pair of rollers opposite to each other is used.
Public/Granted literature
- US20090212297A1 LAMINATING SYSTEM Public/Granted day:2009-08-27
Information query
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