Invention Grant
- Patent Title: Semiconductor light emitting device having a p-type semiconductor layer with a p-type impurity
- Patent Title (中): 具有p型杂质的p型半导体层的半导体发光元件
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Application No.: US13198105Application Date: 2011-08-04
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Publication No.: US08698192B2Publication Date: 2014-04-15
- Inventor: Koichi Tachibana , Hajime Nago , Toshiki Hikosaka , Shigeya Kimura , Shinya Nunoue
- Applicant: Koichi Tachibana , Hajime Nago , Toshiki Hikosaka , Shigeya Kimura , Shinya Nunoue
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2010-268431 20101201
- Main IPC: H01L33/26
- IPC: H01L33/26

Abstract:
According to one embodiment, a semiconductor light emitting device includes an n-type semiconductor layer, a p-type semiconductor layer, a light emitting part, and a p-side electrode. The light emitting part is provided between the n-type and the p-type semiconductor layers, and includes a plurality of barrier layers and a plurality of well layers. The p-side electrode contacts the p-type semiconductor layer. The p-type semiconductor layer includes first, second, third, and fourth p-type layers. The first p-type layer contacts the p-side electrode. The second p-type layer contacts the light emitting part. The third p-type layer is provided between the first p-type layer and the second p-type layer. The fourth p-type layer is provided between the second p-type layer and the third p-type layer. The second p-type layer contains Al and contains a p-type impurity in a lower concentration lower than that in the first concentration.
Public/Granted literature
- US20120138889A1 SEMICONDUCTOR LIGHT EMITTING DEVICE Public/Granted day:2012-06-07
Information query
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