Invention Grant
- Patent Title: Electrode and fabricating method thereof
- Patent Title (中): 电极及其制造方法
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Application No.: US13503903Application Date: 2011-09-08
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Publication No.: US08698267B2Publication Date: 2014-04-15
- Inventor: Yang Wang , Krzysztof Kempa , Zhifeng Ren
- Applicant: Yang Wang , Krzysztof Kempa , Zhifeng Ren
- Applicant Address: CN
- Assignee: South China Normal University
- Current Assignee: South China Normal University
- Current Assignee Address: CN
- Agency: DLA Piper LLP (US)
- International Application: PCT/CN2011/079481 WO 20110908
- International Announcement: WO2012/055302 WO 20120503
- Main IPC: H01L31/107
- IPC: H01L31/107 ; H01L31/0232
Abstract:
An electrode includes a substantially planar metallic thin film layer with a patterned structure including a plurality of parallel lines or a plurality of crossed lines, the metallic thin film layer configured to transmit an incident light through the metallic thin film layer.
Public/Granted literature
- US20120273915A1 ELECTRODE AND FABRICATING METHOD THEREOF Public/Granted day:2012-11-01
Information query
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