Invention Grant
- Patent Title: Substrate structures and methods of manufacturing the same
- Patent Title (中): 基板结构及其制造方法
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Application No.: US12805674Application Date: 2010-08-12
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Publication No.: US08716749B2Publication Date: 2014-05-06
- Inventor: Jun-youn Kim , Hyun-gi Hong , Young-jo Tak , Jae-won Lee , Hyung-su Jeong
- Applicant: Jun-youn Kim , Hyun-gi Hong , Young-jo Tak , Jae-won Lee , Hyung-su Jeong
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2009-0075733 20090817
- Main IPC: H01L21/20
- IPC: H01L21/20

Abstract:
Substrate structures and methods of manufacturing the substrate structures. A substrate structure is manufactured by forming a protrusion area of a substrate under a buffer layer, and forming a semiconductor layer on the buffer layer, thereby separating the substrate from the buffer layer except in an area where the protrusion is formed. The semiconductor layer on the buffer layer not contacting the substrate has freestanding characteristics, and dislocation or cracks may be reduced and/or prevented.
Public/Granted literature
- US20110037098A1 Substrate structures and methods of manufacturing the same Public/Granted day:2011-02-17
Information query
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