Invention Grant
US08728913B2 Method for transferring a layer from a donor substrate onto a handle substrate
有权
用于将层从施主衬底转移到手柄衬底上的方法
- Patent Title: Method for transferring a layer from a donor substrate onto a handle substrate
- Patent Title (中): 用于将层从施主衬底转移到手柄衬底上的方法
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Application No.: US13933779Application Date: 2013-07-02
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Publication No.: US08728913B2Publication Date: 2014-05-20
- Inventor: Sébastien Kerdiles , Walter Schwarzenbach , Aziz Alami-Idrissi
- Applicant: Soitec
- Applicant Address: FR Bernin
- Assignee: Soitec
- Current Assignee: Soitec
- Current Assignee Address: FR Bernin
- Agency: TraskBritt
- Priority: EP09290314 20090429
- Main IPC: H01L21/30
- IPC: H01L21/30 ; H01L21/78
Abstract:
The invention relates to a method for transferring a layer from a donor substrate onto a handle substrate wherein, after detachment, the remainder of the donor substrate is reused. To get rid of undesired protruding edge regions that are due to the chamfered geometry of the substrates, the invention proposes to carry out an additional etching process before detachment occurs.
Public/Granted literature
- US20130295696A1 METHOD FOR TRANSFERRING A LAYER FROM A DONOR SUBSTRATE ONTO A HANDLE SUBSTRATE Public/Granted day:2013-11-07
Information query
IPC分类:
