发明授权
- 专利标题: Non-volatile semiconductor storage device and method of manufacturing the same
- 专利标题(中): 非易失性半导体存储装置及其制造方法
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申请号: US13723601申请日: 2012-12-21
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公开(公告)号: US08728919B2公开(公告)日: 2014-05-20
- 发明人: Masaru Kito , Yoshiaki Fukuzumi , Masaru Kidoh , Megumi Ishiduki , Yosuke Komori , Hiroyasu Tanaka , Ryota Katsumata , Hideaki Aochi
- 申请人: Masaru Kito , Yoshiaki Fukuzumi , Masaru Kidoh , Megumi Ishiduki , Yosuke Komori , Hiroyasu Tanaka , Ryota Katsumata , Hideaki Aochi
- 申请人地址: JP Tokyo
- 专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人地址: JP Tokyo
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JP2008-320590 20081217
- 主分类号: H01L21/20
- IPC分类号: H01L21/20
摘要:
A non-volatile semiconductor storage device includes a plurality of memory strings each having a plurality of electrically rewritable memory cells connected in series. Each of the memory strings comprising: a first semiconductor layer including a columnar portion extending in a vertical direction with respect to a substrate; a plurality of first conductive layers formed to surround side surfaces of the columnar portions via insulation layers, and formed at a certain pitch in the vertical direction, the first conductive layers functioning as floating gates of the memory cells; and a plurality of second conductive layers formed to surround the first conductive layers via insulation layers, and functioning as control electrodes of the memory cells. Each of the first conductive layers has a length in the vertical direction that is shorter than a length in the vertical direction of each of the second conductive layers.
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