Invention Grant
- Patent Title: Bipolar electrostatic chuck
- Patent Title (中): 双极静电吸盘
-
Application No.: US12997826Application Date: 2009-06-30
-
Publication No.: US08730644B2Publication Date: 2014-05-20
- Inventor: Hiroshi Fujisawa , Yoshiaki Tatsumi
- Applicant: Hiroshi Fujisawa , Yoshiaki Tatsumi
- Applicant Address: JP Tokyo
- Assignee: Creative Technology Corporation
- Current Assignee: Creative Technology Corporation
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2008-177797 20080708
- International Application: PCT/JP2009/061975 WO 20090630
- International Announcement: WO2010/004915 WO 20100114
- Main IPC: H01L21/683
- IPC: H01L21/683 ; H01T23/00

Abstract:
Provided is a bipolar electrostatic chuck, which has excellent substrate attracting/holding performance when a voltage is applied, and excellent residual charges reducing performance when voltage application is stopped. The bipolar electrostatic chuck includes at least an electrode layer including a first electrode and a second electrode, and an upper insulating layer which forms a substrate attracting surface for attracting a substrate. In a case where a surface of the electrode layer is regarded to be divided into a plurality of virtual cells having a predetermined width (L) in an x direction and a y direction, first electrode sections forming the first electrode and second electrode sections forming the second electrode are alternately arranged in the plurality of virtual cells in the x direction, and are alternately arranged in the plurality of virtual cells in the y direction.
Public/Granted literature
- US20110102965A1 BIPOLAR ELECTROSTATIC CHUCK Public/Granted day:2011-05-05
Information query
IPC分类: