Invention Grant
US08734664B2 Method of differential counter electrode tuning in an RF plasma reactor
有权
RF等离子体反应器中差分对电极调谐的方法
- Patent Title: Method of differential counter electrode tuning in an RF plasma reactor
- Patent Title (中): RF等离子体反应器中差分对电极调谐的方法
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Application No.: US13958898Application Date: 2013-08-05
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Publication No.: US08734664B2Publication Date: 2014-05-27
- Inventor: Yang Yang , Kartik Ramaswamy , Kenneth S. Collins , Steven Lane , Douglas A. Buchberger, Jr. , Lawrence Wong , Nipun Misra
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agent Robert M. Wallace
- Main IPC: B44C1/22
- IPC: B44C1/22 ; C03C15/00 ; C03C25/68 ; C23F1/00
Abstract:
A method of controlling distribution of a plasma parameter in a plasma reactor having an RF-driven electrode and two (or more) counter electrodes opposite the RF driven electrode and facing different portions of the process zones. The method includes providing two (or more) variable reactances connected between respective ones of the counter electrodes and ground, and governing the variable reactances to change distribution of a plasma parameter such as plasma ion density or ion energy.
Public/Granted literature
- US20140034612A1 METHOD OF DIFFERENTIAL COUNTER ELECTRODE TUNING IN AN RF PLASMA REACTOR Public/Granted day:2014-02-06
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