发明授权
US08734904B2 Methods of forming topographical features using segregating polymer mixtures
有权
使用分离聚合物混合物形成地形特征的方法
- 专利标题: Methods of forming topographical features using segregating polymer mixtures
- 专利标题(中): 使用分离聚合物混合物形成地形特征的方法
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申请号: US12957008申请日: 2010-11-30
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公开(公告)号: US08734904B2公开(公告)日: 2014-05-27
- 发明人: Joy Cheng , Hayato Namai , Charles Thomas Rettner , Daniel Paul Sanders , Ratnam Sooriyakumaran
- 申请人: Joy Cheng , Hayato Namai , Charles Thomas Rettner , Daniel Paul Sanders , Ratnam Sooriyakumaran
- 申请人地址: US NY Armonk JP Tokyo
- 专利权人: International Business Machines Corporation,JSR Corporation
- 当前专利权人: International Business Machines Corporation,JSR Corporation
- 当前专利权人地址: US NY Armonk JP Tokyo
- 代理商 Michael R. Roberts
- 主分类号: B81C1/00
- IPC分类号: B81C1/00 ; B82Y40/00 ; H01L21/027
摘要:
Methods are disclosed for forming topographical features. In one method, a pre-patterned structure is provided which comprises i) a support member having a surface and ii) an element for topographically guiding segregation of a polymer mixture including a first polymer and a second polymer, the element comprising a feature having a sidewall adjoined to the surface. The polymer mixture is disposed on the pre-patterned structure, wherein the disposed polymer mixture has contact with the sidewall and the surface. The first polymer and the second polymer are segregated in a plane parallel to the surface, thereby forming a segregated structure comprising a first polymer domain and a second polymer domain. The first polymer domain and/or the second polymer domain are lithographically patterned, thereby forming topographical features comprising at least one of i) a first feature comprising a lithographically patterned first polymer domain and ii) a second feature comprising a lithographically patterned second polymer domain.