Methods of forming topographical features using segregating polymer mixtures
    1.
    发明授权
    Methods of forming topographical features using segregating polymer mixtures 有权
    使用分离聚合物混合物形成地形特征的方法

    公开(公告)号:US08734904B2

    公开(公告)日:2014-05-27

    申请号:US12957008

    申请日:2010-11-30

    IPC分类号: B81C1/00 B82Y40/00 H01L21/027

    摘要: Methods are disclosed for forming topographical features. In one method, a pre-patterned structure is provided which comprises i) a support member having a surface and ii) an element for topographically guiding segregation of a polymer mixture including a first polymer and a second polymer, the element comprising a feature having a sidewall adjoined to the surface. The polymer mixture is disposed on the pre-patterned structure, wherein the disposed polymer mixture has contact with the sidewall and the surface. The first polymer and the second polymer are segregated in a plane parallel to the surface, thereby forming a segregated structure comprising a first polymer domain and a second polymer domain. The first polymer domain and/or the second polymer domain are lithographically patterned, thereby forming topographical features comprising at least one of i) a first feature comprising a lithographically patterned first polymer domain and ii) a second feature comprising a lithographically patterned second polymer domain.

    摘要翻译: 公开了形成形貌特征的方法。 在一种方法中,提供预先图案化的结构,其包括i)具有表面的支撑构件和ii)用于拓扑地引导包括第一聚合物和第二聚合物的聚合物混合物的偏析的元件,所述元件包括具有 侧壁与表面相邻。 聚合物混合物设置在预图案化结构上,其中所设置的聚合物混合物与侧壁和表面接触。 第一聚合物和第二聚合物在平行于表面的平面中分离,从而形成包含第一聚合物结构域和第二聚合物结构域的分离结构。 第一聚合物结构域和/或第二聚合物结构域被光刻图案化,从而形成包括以下至少一个的拓扑特征:i)包含光刻图案化的第一聚合物结构域的第一特征和ii)包含光刻图案化的第二聚合物结构域的第二特征。

    METHODS OF FORMING TOPOGRAPHICAL FEATURES USING SEGREGATING POLYMER MIXTURES
    2.
    发明申请
    METHODS OF FORMING TOPOGRAPHICAL FEATURES USING SEGREGATING POLYMER MIXTURES 有权
    使用分散聚合物混合物形成地形特征的方法

    公开(公告)号:US20120135146A1

    公开(公告)日:2012-05-31

    申请号:US12957008

    申请日:2010-11-30

    IPC分类号: B05D3/12

    摘要: Methods are disclosed for forming topographical features. In one method, a pre-patterned structure is provided which comprises i) a support member having a surface and ii) an element for topographically guiding segregation of a polymer mixture including a first polymer and a second polymer, the element comprising a feature having a sidewall adjoined to the surface. The polymer mixture is disposed on the pre-patterned structure, wherein the disposed polymer mixture has contact with the sidewall and the surface. The first polymer and the second polymer are segregated in a plane parallel to the surface, thereby forming a segregated structure comprising a first polymer domain and a second polymer domain. The first polymer domain and/or the second polymer domain are lithographically patterned, thereby forming topographical features comprising at least one of i) a first feature comprising a lithographically patterned first polymer domain and ii) a second feature comprising a lithographically patterned second polymer domain.

    摘要翻译: 公开了形成形貌特征的方法。 在一种方法中,提供预先图案化的结构,其包括i)具有表面的支撑构件和ii)用于拓扑地引导包括第一聚合物和第二聚合物的聚合物混合物的偏析的元件,所述元件包括具有 侧壁与表面相邻。 聚合物混合物设置在预图案化结构上,其中所设置的聚合物混合物与侧壁和表面接触。 第一聚合物和第二聚合物在平行于表面的平面中分离,从而形成包含第一聚合物结构域和第二聚合物结构域的分离结构。 第一聚合物结构域和/或第二聚合物结构域被光刻图案化,从而形成包括以下至少一个的拓扑特征:i)包含光刻图案化的第一聚合物结构域的第一特征和ii)包含光刻图案化的第二聚合物结构域的第二特征。

    METHOD FOR IMPROVING SELF-ASSEMBLED POLYMER FEATURES
    3.
    发明申请
    METHOD FOR IMPROVING SELF-ASSEMBLED POLYMER FEATURES 有权
    改善自组装聚合物特征的方法

    公开(公告)号:US20120103935A1

    公开(公告)日:2012-05-03

    申请号:US12913835

    申请日:2010-10-28

    IPC分类号: B05D3/10

    摘要: A method for processing a structure. The structure is formed and includes a substrate, a substructure having a sidewall and disposed on the substrate, a first polymer structure disposed on the substrate, and a second polymer structure disposed on the substrate such that the first polymer structure is disposed between the sidewall and the second polymer structure. An aspect ratio of the first polymer structure, the second polymer structure, or both is reduced in a reducing step. One polymer structure (i.e., the first polymer structure or the second polymer structure) is selectively removed from the structure such that a remaining polymer structure (i.e., the second polymer structure or the first polymer structure) remains disposed on the external surface of the substrate after the one polymer structure has been selectively removed, wherein the aspect ratio of the remaining polymer structure was reduced in the reducing step.

    摘要翻译: 一种处理结构的方法。 该结构被形成并且包括衬底,具有侧壁并设置在衬底上的子结构,设置在衬底上的第一聚合物结构和设置在衬底上的第二聚合物结构,使得第一聚合物结构设置在侧壁和 第二聚合物结构。 在还原步骤中,第一聚合物结构,第二聚合物结构或两者的纵横比减小。 从结构中选择性地除去一种聚合物结构(即,第一聚合物结构或第二聚合物结构),使得剩余的聚合物结构(即,第二聚合物结构或第一聚合物结构)保留在基材的外表面上 在选择性去除一种聚合物结构之后,在还原步骤中其余聚合物结构的纵横比降低。

    Method for improving self-assembled polymer features
    4.
    发明授权
    Method for improving self-assembled polymer features 有权
    改进自组装聚合物特征的方法

    公开(公告)号:US09233840B2

    公开(公告)日:2016-01-12

    申请号:US12913835

    申请日:2010-10-28

    摘要: A method for processing a structure. The structure is formed and includes a substrate, a substructure having a sidewall and disposed on the substrate, a first polymer structure disposed on the substrate, and a second polymer structure disposed on the substrate such that the first polymer structure is disposed between the sidewall and the second polymer structure. An aspect ratio of the first polymer structure, the second polymer structure, or both is reduced in a reducing step. One polymer structure (i.e., the first polymer structure or the second polymer structure) is selectively removed from the structure such that a remaining polymer structure (i.e., the second polymer structure or the first polymer structure) remains disposed on the external surface of the substrate after the one polymer structure has been selectively removed, wherein the aspect ratio of the remaining polymer structure was reduced in the reducing step.

    摘要翻译: 一种处理结构的方法。 该结构被形成并且包括衬底,具有侧壁并设置在衬底上的子结构,设置在衬底上的第一聚合物结构和设置在衬底上的第二聚合物结构,使得第一聚合物结构设置在侧壁和 第二聚合物结构。 在还原步骤中,第一聚合物结构,第二聚合物结构或两者的纵横比减小。 从结构中选择性地除去一种聚合物结构(即,第一聚合物结构或第二聚合物结构),使得剩余的聚合物结构(即,第二聚合物结构或第一聚合物结构)保留在基材的外表面上 在选择性去除一种聚合物结构之后,在还原步骤中其余聚合物结构的纵横比降低。

    Pattern-forming method
    6.
    发明授权
    Pattern-forming method 有权
    图案形成方法

    公开(公告)号:US08703395B2

    公开(公告)日:2014-04-22

    申请号:US13283582

    申请日:2011-10-28

    IPC分类号: G03F7/26

    摘要: A pattern-forming method includes applying a photoresist composition to a substrate to form a resist film. The photoresist composition includes an acid generator and a first polymer that includes an acid-dissociable group. The resist film is exposed. The resist film is developed using a developer having an organic solvent content of 80 mass % or more to form a prepattern of the resist film. A polymer film having a phase separation structure in a space defined by the prepattern is formed using a composition that includes a plurality of second polymers. A part of the phase separation structure of the polymer film is removed.

    摘要翻译: 图案形成方法包括将光致抗蚀剂组合物施加到基底以形成抗蚀剂膜。 光致抗蚀剂组合物包括酸产生剂和包含酸解离基团的第一聚合物。 抗蚀剂膜被曝光。 使用有机溶剂含量为80质量%以上的显影剂显影抗蚀剂膜,以形成抗蚀剂膜的前体图案。 使用包含多个第二聚合物的组合物形成在由预制图案限定的空间中具有相分离结构的聚合物膜。 除去聚合物膜的相分离结构的一部分。

    NEGATIVE-TONE RADIATION-SENSITIVE COMPOSITION, CURED PATTERN FORMING METHOD, AND CURED PATTERN
    7.
    发明申请
    NEGATIVE-TONE RADIATION-SENSITIVE COMPOSITION, CURED PATTERN FORMING METHOD, AND CURED PATTERN 审中-公开
    负离子辐射敏感组合物,固化图案形成方法和固化图案

    公开(公告)号:US20100167024A1

    公开(公告)日:2010-07-01

    申请号:US12647375

    申请日:2009-12-24

    IPC分类号: B32B3/10 G03F7/004 G03F7/20

    CPC分类号: G03F7/0757 Y10T428/24802

    摘要: A negative-tone radiation-sensitive composition includes a polymer, a photoacid generator, and a solvent. The polymer has a polystyrene-reduced weight average molecular weight of 4000 to 200,000, and is obtained by hydrolysis and condensation of at least one hydrolyzable silane compound among compounds shown by RaSi(OR1)4-a, Si(OR2)4 and R3x(R4O)3-xSi—(R7)z—Si(OR5)3-yR6y. “R” represents a fluorine atom, an alkylcarbonyloxy group, or a linear or branched alkyl group having 1 to 5 carbon atoms. “R1” represents a monovalent organic group. “R2” represents a monovalent organic group. “R3” and “R6” individually represent a fluorine atom, an alkylcarbonyloxy group, or a linear or branched alkyl group having 1 to 5 carbon atoms “R4” and “R5” individually represent a monovalent organic group. “R7” represents an oxygen atom, a phenylene group, or a group —(CH2)m—. The content of units derived from the compound RaSi(OR1)4-a is 50 to 100 mol % of the total units forming the polymer.

    摘要翻译: 负色辐射敏感组合物包括聚合物,光致酸产生剂和溶剂。 聚苯乙烯换算的重均分子量为4000〜200,000,通过RaSi(OR1)4-a,Si(OR2)4和R3x(OR1)4-a表示的化合物中至少一种可水解硅烷化合物的水解和缩合得到, R4O)3-xSi-(R7)z-Si(OR5)3-yR6y。 “R”表示氟原子,烷基羰基氧基或碳原子数1〜5的直链或支链烷基。 “R1”表示一价有机基团。 “R2”表示一价有机基团。 “R3”和“R6”分别表示氟原子,烷基羰基氧基或碳原子数为1〜5的直链或支链烷基,“R4”和“R5”分别表示一价有机基团。 “R7”表示氧原子,亚苯基或基团 - (CH2)m-。 衍生自化合物RaSi(OR1)4-a的单元的含量为形成聚合物的总单元的50〜100摩尔%。

    Pattern-forming method
    9.
    发明授权
    Pattern-forming method 有权
    图案形成方法

    公开(公告)号:US08968586B2

    公开(公告)日:2015-03-03

    申请号:US13397017

    申请日:2012-02-15

    申请人: Hayato Namai

    发明人: Hayato Namai

    IPC分类号: B44C1/22

    摘要: A pattern-forming method includes forming a prepattern on a substrate. A space other than a space in which the prepattern is formed on the substrate is filled with a resin composition containing a compound which is diffusible into the prepattern. The compound is diffused into a part of the prepattern. Portions in which the compound is undiffused in the prepattern are removed using a removing liquid.

    摘要翻译: 图案形成方法包括在基板上形成预制图案。 在基板上形成预制图案的空间之外的空间填充有包含可扩散到预图案中的化合物的树脂组合物。 化合物扩散到预制图案的一部分。 使用去除液体除去在预模式中化合物不扩散的部分。