发明授权
- 专利标题： Heterogeneous annealing method and device
- 专利标题（中）： 异相退火方法及装置
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申请号： US13599023申请日： 2012-08-30
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公开(公告)号： US08735219B2公开(公告)日： 2014-05-27
- 发明人: Paul M. Enquist , Gaius Gillman Fountain
- 申请人： Paul M. Enquist , Gaius Gillman Fountain
- 申请人地址： US NC Morrisville
- 专利权人： Ziptronix, Inc.
- 当前专利权人： Ziptronix, Inc.
- 当前专利权人地址： US NC Morrisville
- 代理机构： Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 主分类号： H01L21/48
- IPC分类号： H01L21/48
摘要：
A method of integrating a first substrate having a first surface with a first insulating material and a first contact structure with a second substrate having a second surface with a second insulating material and a second contact structure. The first insulating material is directly bonded to the second insulating material. A portion of the first substrate is removed to leave a remaining portion. A third substrate having a coefficient of thermal expansion (CTE) substantially the same as a CTE of the first substrate is bonded to the remaining portion. The bonded substrates are heated to facilitate electrical contact between the first and second contact structures. The third substrate is removed after heating to provided a bonded structure with reliable electrical contacts.
公开/授权文献
- US20140061949A1 HETEROGENEOUS ANNEALING METHOD AND DEVICE 公开/授权日：2014-03-06
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