利索-全球专利检索

  1. 登录
  2. 注册
发明授权
US08736058B2 Low-resistance conductive pattern structures and methods of fabricating the same 有权
低电阻导电图案结构及其制造方法

Low-resistance conductive pattern structures and methods of fabricating the same
摘要：
A conductive structure includes a contact plug extending through an insulating layer on a substrate, and first and second conductive lines extending alongside one another on the insulating layer. The first conductive line extends on the contact plug. A connecting line on the insulating layer extends between and electrically connects the first and second conductive lines. Related integrated circuit devices and fabrication methods are also discussed.
摘要（中）：

导电结构包括延伸穿过衬底上的绝缘层的接触插塞以及在绝缘层上彼此并排延伸的第一和第二导电线。 第一导线延伸在接触插头上。 绝缘层上的连接线在第一和第二导电线之间延伸并电连接。 还讨论了相关的集成电路器件和制造方法。

公开/授权文献
信息查询
Espacenet
0/0