发明授权
- 专利标题: Electron beam generating apparatus
- 专利标题(中): 电子束发生装置
-
申请号: US13122109申请日: 2010-08-10
-
公开(公告)号: US08736169B2公开(公告)日: 2014-05-27
- 发明人: Yong Woon Park , Sung Ju Park , In Soo Ko , Chang Bum Kim , Ju Ho Hong , Sung Ik Moon
- 申请人: Yong Woon Park , Sung Ju Park , In Soo Ko , Chang Bum Kim , Ju Ho Hong , Sung Ik Moon
- 申请人地址: KR Gyeongsangbuk-Do
- 专利权人: Postech Academy-Industry Foundation
- 当前专利权人: Postech Academy-Industry Foundation
- 当前专利权人地址: KR Gyeongsangbuk-Do
- 代理机构: McCarter & English, LLP
- 代理商 David R. Burns
- 优先权: KR10-2009-0077796 20090821
- 国际申请: PCT/KR2010/005236 WO 20100810
- 国际公布: WO2011/021802 WO 20110224
- 主分类号: H01J29/80
- IPC分类号: H01J29/80
摘要:
An apparatus for generating an electron beam is disclosed to reduce emittance of an electron beam. The apparatus includes: a housing including a rear portion where an electron beam is generated, a front portion having an electron beam discharge hole for discharging the electron beam to the exterior, and a side portion connecting the rear portion and the front portion, the side portion having a first hole and an opposite side portion, facing the first hole, having a second hole in order to reduce asymmetry of an electric field caused by the first hole; and a waveguide installed on the side portion to supply an electromagnetic wave to the interior of the housing through the first hole, wherein the electron beam is generated by laser incident to the interior of the housing and accelerated by the electromagnetic wave supplied to the interior of the housing.
公开/授权文献
- US20120133281A1 ELECTRON BEAM GENERATING APPARATUS 公开/授权日:2012-05-31