发明授权
- 专利标题: Method for making a wafer level aluminum nitride substrate
- 专利标题(中): 制造晶圆级氮化铝衬底的方法
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申请号: US13237100申请日: 2011-09-20
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公开(公告)号: US08741211B2公开(公告)日: 2014-06-03
- 发明人: Yang-Kuao Kuo , Ching-Hui ChiangLin , Te-Po Liu
- 申请人: Yang-Kuao Kuo , Ching-Hui ChiangLin , Te-Po Liu
- 申请人地址: TW Taoyuan County
- 专利权人: Chung-Shan Institute of Science and Technology, Armaments, Bureau, Ministry of National Defense
- 当前专利权人: Chung-Shan Institute of Science and Technology, Armaments, Bureau, Ministry of National Defense
- 当前专利权人地址: TW Taoyuan County
- 代理机构: Jackson IPG PLLC
- 优先权: TW100127710A 20110804
- 主分类号: C04B35/581
- IPC分类号: C04B35/581
摘要:
Disclosed is a method for making a pure aluminum nitride substrate. At first, aluminum nitride is mixed with a water-resistant material and an adhesive material. The mixture is made into grains in a granulation process. The grains are molded into a nugget in a steel mode by hydraulic pressure. The nugget is subjected to a cold isostatic pressing process. At a low temperature, the water-resistant material and the adhesive material are removed from the nugget. Then, the nugget, boron nitride and nitrogen are introduced into and sintered in an oven, thus providing a pure aluminum nitride substrate. The purity and quality of the aluminum nitride substrate are high. The aluminum nitride substrate can be used in a light-emitting diode. The method is simple, the yield is high, and the heat radiation of the aluminum nitride substrate is excellent.
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