Invention Grant
- Patent Title: Method and composition of a dual sensitive resist
- Patent Title (中): 双敏感抗蚀剂的方法和组成
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Application No.: US13442687Application Date: 2012-04-09
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Publication No.: US08741551B2Publication Date: 2014-06-03
- Inventor: Chen-Hau Wu , Ching-Yu Chang
- Applicant: Chen-Hau Wu , Ching-Yu Chang
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Haynes and Boone, LLP
- Main IPC: G03F7/26
- IPC: G03F7/26
Abstract:
The present disclosure provides a sensitive material. The sensitive material includes a polymer that turns soluble to a base solution in response to reaction with acid; a plurality of photo-base generators (PBGs) that decompose to form base in response to radiation energy; and a thermal sensitive component that generates acid in response to thermal energy.
Public/Granted literature
- US20130266899A1 METHOD AND COMPOSITION OF A DUAL SENSITIVE RESIST Public/Granted day:2013-10-10
Information query
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