发明授权
- 专利标题： Layout designs with via routing structures
- 专利标题（中）： 布局设计通过路由结构
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申请号： US13465129申请日： 2012-05-07
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公开(公告)号： US08741763B2公开(公告)日： 2014-06-03
- 发明人: Yuansheng Ma , Jongwook Kye , Harry Levinson , Hidekazu Yoshida , Mahbub Rashed
- 申请人： Yuansheng Ma , Jongwook Kye , Harry Levinson , Hidekazu Yoshida , Mahbub Rashed
- 申请人地址： KY Grand Cayman
- 专利权人： GLOBALFOUNDRIES Inc.
- 当前专利权人： GLOBALFOUNDRIES Inc.
- 当前专利权人地址： KY Grand Cayman
- 代理机构： Ditthavong Mori & Steiner, P.C.
- 主分类号： H01L21/44
- IPC分类号： H01L21/44 ; H01L23/528
摘要：
An approach for providing layout designs with via routing structures is disclosed. Embodiments include: providing a gate structure and a diffusion contact on a substrate; providing a gate contact on the gate structure; providing a metal routing structure that does not overlie a portion of the gate contact, the diffusion contact, or a combination thereof; and providing a via routing structure over the portion and under a part of the metal routing structure to couple the gate contact, the diffusion contact, or a combination thereof to the metal routing structure.
公开/授权文献
- US20130292772A1 LAYOUT DESIGNS WITH VIA ROUTING STRUCTURES 公开/授权日：2013-11-07