发明授权
US08742493B2 Semiconductor devices having vertical channel transistors and methods for fabricating the same 有权
具有垂直沟道晶体管的半导体器件及其制造方法

Semiconductor devices having vertical channel transistors and methods for fabricating the same
摘要:
A semiconductor device has a plurality of vertical channels extending upright on a substrate, a plurality of bit lines extending among the vertical channels, a plurality of word lines which include a plurality of gates disposed adjacent first sides of the vertical channels, respectively, and a plurality of conductive elements disposed adjacent second sides of the vertical channels opposite the first sides. The conductive elements can provide a path to the substrate for charge carriers which have accumulated in the associated vertical channel to thereby mitigate a so-called floating effect.
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