发明授权
- 专利标题: Semiconductor devices having vertical channel transistors and methods for fabricating the same
- 专利标题(中): 具有垂直沟道晶体管的半导体器件及其制造方法
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申请号: US13285263申请日: 2011-10-31
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公开(公告)号: US08742493B2公开(公告)日: 2014-06-03
- 发明人: Dae-Ik Kim , Hyeong-Sun Hong , Yoo-Sang Hwang , Hyun-Woo Chung
- 申请人: Dae-Ik Kim , Hyeong-Sun Hong , Yoo-Sang Hwang , Hyun-Woo Chung
- 申请人地址: KR Suwon-si, Gyeonggi-do
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR Suwon-si, Gyeonggi-do
- 代理机构: Volentine & Whitt, PLLC
- 优先权: KR10-2010-0112260 20101111
- 主分类号: H01L27/108
- IPC分类号: H01L27/108
摘要:
A semiconductor device has a plurality of vertical channels extending upright on a substrate, a plurality of bit lines extending among the vertical channels, a plurality of word lines which include a plurality of gates disposed adjacent first sides of the vertical channels, respectively, and a plurality of conductive elements disposed adjacent second sides of the vertical channels opposite the first sides. The conductive elements can provide a path to the substrate for charge carriers which have accumulated in the associated vertical channel to thereby mitigate a so-called floating effect.
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