发明授权
- 专利标题: Protecting element having first and second high concentration impurity regions separated by insulating region
- 专利标题(中): 保护元件具有由绝缘区域隔开的第一和第二高浓度杂质区域
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申请号: US13475375申请日: 2012-05-18
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公开(公告)号: US08742506B2公开(公告)日: 2014-06-03
- 发明人: Tetsuro Asano , Mikito Sakakibara , Toshikazu Hirai
- 申请人: Tetsuro Asano , Mikito Sakakibara , Toshikazu Hirai
- 申请人地址: US AZ Phoenix
- 专利权人: Semiconductor Components Industries, LLC
- 当前专利权人: Semiconductor Components Industries, LLC
- 当前专利权人地址: US AZ Phoenix
- 优先权: JP2002-262844 20020909
- 主分类号: H01L29/861
- IPC分类号: H01L29/861
摘要:
With a microwave FET, an incorporated Schottky junction capacitance or PN junction capacitance is small and such a junction is weak against static electricity. However, with a microwave device, the method of connecting a protecting diode cannot be used since this method increases the parasitic capacitance and causes degradation of the high-frequency characteristics. In order to solve the above problems, a protecting element, having a first n+-type region-insulating region-second n+-type region arrangement is connected in parallel between two terminals of a protected element having a PN junction, Schottky junction, or capacitor. Since discharge can be performed between the first and second n+ regions that are adjacent each other, electrostatic energy that would reach the operating region of an FET can be attenuated without increasing the parasitic capacitance.
公开/授权文献
- US20120228738A1 PROTECTING ELEMENT 公开/授权日:2012-09-13
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