Invention Grant
- Patent Title: Photodiode and photodiode array
- Patent Title (中): 光电二极管和光电二极管阵列
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Application No.: US13147884Application Date: 2010-02-15
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Publication No.: US08742528B2Publication Date: 2014-06-03
- Inventor: Kazuhisa Yamamura , Akira Sakamoto , Terumasa Nagano , Yoshitaka Ishikawa , Satoshi Kawai
- Applicant: Kazuhisa Yamamura , Akira Sakamoto , Terumasa Nagano , Yoshitaka Ishikawa , Satoshi Kawai
- Applicant Address: JP Hamamatsu-shi, Shizuoka
- Assignee: Hamamatsu Photonics K.K.
- Current Assignee: Hamamatsu Photonics K.K.
- Current Assignee Address: JP Hamamatsu-shi, Shizuoka
- Agency: Drinker Biddle & Reath LLP
- Priority: JP2009-041078 20090224; JP2009-136419 20090605
- International Application: PCT/JP2010/052212 WO 20100215
- International Announcement: WO2010/098225 WO 20100902
- Main IPC: H01L31/0232
- IPC: H01L31/0232 ; H01L27/146

Abstract:
A photodiode array PDA1 is provided with a substrate S wherein a plurality of photodetecting channels CH have an n-type semiconductor layer 32. The photodiode array PDA1 is provided with a p− type semiconductor layer 33 formed on the n-type semiconductor layer 32, resistors 24 provided for the respective photodetecting channels CH and each having one end portion connected to a signal conducting wire 23, and an n-type separating portion 40 formed between the plurality of photodetecting channels CH. The p− type semiconductor layer 33 forms pn junctions at an interface to the n-type semiconductor layer 32 and has a plurality of multiplication regions AM for avalanche multiplication of carriers generated with incidence of detection target light, corresponding to the respective photodetecting channels. An irregular asperity 10 is formed in a surface of the n-type semiconductor layer 32 and the surface is optically exposed.
Public/Granted literature
- US20110291218A1 PHOTODIODE AND PHOTODIODE ARRAY Public/Granted day:2011-12-01
Information query
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