Invention Grant
US08743343B2 Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine
有权
在浸没式光刻机中的晶片更换期间将浸没流体保持在光学组件附近的装置和方法
- Patent Title: Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine
- Patent Title (中): 在浸没式光刻机中的晶片更换期间将浸没流体保持在光学组件附近的装置和方法
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Application No.: US13754111Application Date: 2013-01-30
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Publication No.: US08743343B2Publication Date: 2014-06-03
- Inventor: Alex Ka Tim Poon , Leonard Wai Fung Kho , Gaurav Keswani , Derek Coon , Daishi Tanaka
- Applicant: Nikon Corporation
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Main IPC: G03B27/32
- IPC: G03B27/32 ; G03B27/42 ; G03F7/20
Abstract:
A lithographic projection apparatus includes a projection optical assembly having a final optical element, a stage assembly including a substrate table on which a substrate is supported, the substrate supported by the substrate table being exposed with an exposure beam from the final optical element of the projection optical assembly through an immersion liquid, a confinement member which encircles a portion of a path of the exposure beam, and a movable member which is movable in a space between the confinement member and the substrate, the substrate table, or both, the space being divided by the movable member into a first portion between the confinement member and the movable member and a second portion between the movable member and the substrate, the substrate table, or both. The movable member has a recovery outlet from which the immersion liquid in the second portion is removed.
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