发明授权
- 专利标题: Knowledge artifact analysis system and method
- 专利标题(中): 知识工件分析系统和方法
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申请号: US12145908申请日: 2008-06-25
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公开(公告)号: US08744991B2公开(公告)日: 2014-06-03
- 发明人: Ravi Agarwal , Barath Sundaram , Aparna Ekambaram
- 申请人: Ravi Agarwal , Barath Sundaram , Aparna Ekambaram
- 申请人地址: IN Bangalore
- 专利权人: Infosys Technologies Limited
- 当前专利权人: Infosys Technologies Limited
- 当前专利权人地址: IN Bangalore
- 代理机构: LeClairRyan, a Professional Corporation
- 主分类号: G06N5/02
- IPC分类号: G06N5/02 ; G06F17/00
摘要:
A knowledge tracking and analysis system and method. The method may include: an artifact evaluator that receives various use parameters for each knowledge artifact, operates on the received use parameters, and generates respective parameter scores; and a knowledge index calculator that compiles parameter scores and generates a knowledge index indicative of use of the knowledge entities during the project. The system and method allow analysis and tracking of knowledge artifacts in future projects.
公开/授权文献
- US20090271357A1 KNOWLEDGE ARTIFACT ANALYSIS SYSTEM AND METHOD 公开/授权日:2009-10-29
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