Invention Grant
- Patent Title: SOI switch enhancement
- Patent Title (中): SOI开关增强
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Application No.: US13892992Application Date: 2013-05-13
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Publication No.: US08749296B2Publication Date: 2014-06-10
- Inventor: Marcus Granger-Jones
- Applicant: RF Micro Devices, Inc.
- Applicant Address: US NC Greensboro
- Assignee: RF Micro Devices, Inc.
- Current Assignee: RF Micro Devices, Inc.
- Current Assignee Address: US NC Greensboro
- Agency: Withrow & Terranova, P.L.L.C.
- Main IPC: H03K17/687
- IPC: H03K17/687

Abstract:
The described FET switch topology greatly reduces the off state loading experienced by the gate biasing resistors in a stacked FET structure. The FET switch topology evenly distributes the voltage across the FET switch topology which reduces the voltage across the gate biasing resistors when the stacked FET structure is in an off state. Because the off state loading is reduced, there is a corresponding reduction of the current through bias resistors, which permits a reduction in the size of the bias resistors. This permits a substantial reduction in the area attributed to the bias resistors in an integrated solution.
Public/Granted literature
- US20130249619A1 SOI SWITCH ENHANCEMENT Public/Granted day:2013-09-26
Information query
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