发明授权
US08753954B2 Semiconductor device having capacitors fixed to support patterns and method for manufacturing the same
有权
具有固定在支撑图案上的电容器的半导体器件及其制造方法
- 专利标题： Semiconductor device having capacitors fixed to support patterns and method for manufacturing the same
- 专利标题（中）： 具有固定在支撑图案上的电容器的半导体器件及其制造方法
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申请号： US13553078申请日： 2012-07-19
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公开(公告)号： US08753954B2公开(公告)日： 2014-06-17
- 发明人: Sung Min Park
- 申请人： Sung Min Park
- 申请人地址： KR Gyeonggi-do
- 专利权人： Hynix Semiconductor Inc.
- 当前专利权人： Hynix Semiconductor Inc.
- 当前专利权人地址： KR Gyeonggi-do
- 代理机构： Ladas & Parry LLP
- 优先权： KR10-2008-0030345 20080401
- 主分类号： H01L21/311
- IPC分类号： H01L21/311
摘要：
A semiconductor device containing a cylindrical shaped capacitor and a method for manufacturing the same is presented. The semiconductor device includes a plurality of storage nodes and a support pattern. The plurality of storage nodes is formed over a semiconductor substrate. The support pattern is fixed to adjacent storage nodes in which the support pattern has a flowable insulation layer buried within the support pattern. The buried flowable insulation layer direct contacts adjacent storage nodes.
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