发明授权
- 专利标题: Plasma shutter forming apparatus and forming method
- 专利标题(中): 等离子体快门成型装置和成型方法
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申请号: US12910089申请日: 2010-10-22
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公开(公告)号: US08755103B2公开(公告)日: 2014-06-17
- 发明人: Masayuki Suzuki , Hiromitsu Kiriyama , Izuru Daito , Hajime Okada , Hironori Sugiyama , Shinichi Matsuoka , Hirofumi Kan
- 申请人: Masayuki Suzuki , Hiromitsu Kiriyama , Izuru Daito , Hajime Okada , Hironori Sugiyama , Shinichi Matsuoka , Hirofumi Kan
- 申请人地址: JP Shizuoka
- 专利权人: Hamamatsu Photonics K.K.
- 当前专利权人: Hamamatsu Photonics K.K.
- 当前专利权人地址: JP Shizuoka
- 代理机构: Wenderoth, Lind & Ponack, L.L.P.
- 优先权: JP2009-244896 20091023
- 主分类号: G02B26/04
- IPC分类号: G02B26/04
摘要:
A plasma shutter forming apparatus for forming a plasma shutter used in a system configured to generate and accelerate radiations by irradiating a target with a laser pulse and generating a high-density plasma for blocking the laser pulse which is returned as a feedback light to upstream of the system without being absorbed by the high-density plasma, including a plasma shutter generating target, and a plasma shutter triggering laser irradiator, wherein the laser pulse from the plasma shutter triggering laser irradiator is directed to the plasma shutter generating target to generate the high-density plasma and form the plasma shutter, thereby blocking the laser pulse which is returned as the feedback light. Optics are prevented from becoming damaged by feedback light reflecting when generating the high-density plasma in a laser-driven radiation generating system and returning back to the upstream of the laser system.
公开/授权文献
- US20110096385A1 PLASMA SHUTTER FORMING APPARATUS AND FORMING METHOD 公开/授权日:2011-04-28
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