Invention Grant
- Patent Title: Overlapping interconnect signal lines for reducing capacitive coupling effects
- Patent Title (中): 用于降低电容耦合效应的重叠互连信号线
-
Application No.: US12971273Application Date: 2010-12-17
-
Publication No.: US08760952B2Publication Date: 2014-06-24
- Inventor: David V. Carlson
- Applicant: David V. Carlson
- Applicant Address: US TX Coppell
- Assignee: STMicroelectronics, Inc.
- Current Assignee: STMicroelectronics, Inc.
- Current Assignee Address: US TX Coppell
- Agency: Wolf, Greenfield & Sacks, P.C.
- Main IPC: G11C7/02
- IPC: G11C7/02

Abstract:
Described herein are various principles for designing, manufacturing, and operating integrated circuits having functional components and one or more metal interconnect layers, where the dimensions of signal lines of the metal interconnect layers are larger than dimensions of the functional components. In some embodiments, a signal line may have a width greater than a width of a terminal of a functional component to which the signal line is connected. In some embodiments, two functional components formed in a same functional layer of the integrated circuit may be connected to metal signal lines in different metal interconnect layers. Further, the metal signal lines of the different metal interconnect layers may overlap some distance.
Public/Granted literature
- US20120155195A1 OVERLAPPING INTERCONNECT SIGNAL LINES Public/Granted day:2012-06-21
Information query