Invention Grant
US08764978B2 System for treating a substance with wave energy from an electrical arc and a second source 有权
用于处理具有来自电弧和第二源的波能的物质的系统

  • Patent Title: System for treating a substance with wave energy from an electrical arc and a second source
  • Patent Title (中): 用于处理具有来自电弧和第二源的波能的物质的系统
  • Application No.: US13186772
    Application Date: 2011-07-20
  • Publication No.: US08764978B2
    Publication Date: 2014-07-01
  • Inventor: Todd Foret
  • Applicant: Todd Foret
  • Applicant Address: US TX The Woodlands
  • Assignee: Foret Plasma Labs, LLC
  • Current Assignee: Foret Plasma Labs, LLC
  • Current Assignee Address: US TX The Woodlands
  • Agency: Chalker Flores, LLP
  • Agent Daniel J. Chalker; Edwin S. Flores
  • Main IPC: C02F1/32
  • IPC: C02F1/32
System for treating a substance with wave energy from an electrical arc and a second source
Abstract:
A system for treating a substance using a storage vessel and two or more devices disposed in a top of the storage vessel. Each device has: (a) a volute or cyclone head, (b) a throat connected to the volute or cyclone head, (c) a parabolic reflector connected to the throat, (d) a first wave energy source comprising a first electrode within the volute or cyclone head that extends through the outlet into the opening of the throat along the central axis, and a second electrode extending into the parabolic reflector and spaced apart and axially aligned with first electrode, and (e) a second wave energy source disposed inside the throat, embedded within the throat or disposed around the throat. The substance is supplied to the inlet of the volute or cyclone head and is irradiated with one or more wave energies produced by the first and second wave energy sources.
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