Invention Grant
- Patent Title: Transitioned film growth for conductive semiconductor materials
- Patent Title (中): 导电半导体材料的过渡膜生长
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Application No.: US12945011Application Date: 2010-11-12
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Publication No.: US08765514B1Publication Date: 2014-07-01
- Inventor: Athanasios J. Syllaios , Michael F. Taylor , Sameer K. Ajmera
- Applicant: Athanasios J. Syllaios , Michael F. Taylor , Sameer K. Ajmera
- Applicant Address: US NY New York
- Assignee: L-3 Communications Corp.
- Current Assignee: L-3 Communications Corp.
- Current Assignee Address: US NY New York
- Agency: Egan, Peterman & Enders LLP.
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A center region of conductive material/s may be disposed or “sandwiched” between transition regions of relatively lower conductivity materials to provide substantially low defect density interfaces for the sandwiched material. The center region and surrounding transition regions may in turn be disposed or sandwiched between dielectric insulative material to form a sandwiched and transitioned device structure. The center region of such a sandwiched structure may be implemented, for example, as a device layer such as conductive microbolometer layer for a microbolometer detector structure.
Public/Granted literature
- US20140159032A1 TRANSITIONED FILM GROWTH FOR CONDUCTIVE SEMICONDUCTOR MATERIALS Public/Granted day:2014-06-12
Information query
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