发明授权
- 专利标题: Method of forming a metal pattern and method of manufacturing a display substrate including the metal pattern
- 专利标题(中): 形成金属图案的方法和制造包括金属图案的显示基板的方法
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申请号: US13406388申请日: 2012-02-27
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公开(公告)号: US08765614B2公开(公告)日: 2014-07-01
- 发明人: Jong-Hyun Choung , Ji-Young Park , Seon-Il Kim , Sang-Gab Kim , In-Bae Kim , Jae-Woo Jeong
- 申请人: Jong-Hyun Choung , Ji-Young Park , Seon-Il Kim , Sang-Gab Kim , In-Bae Kim , Jae-Woo Jeong
- 申请人地址: KR
- 专利权人: Samsung Display Co., Ltd.
- 当前专利权人: Samsung Display Co., Ltd.
- 当前专利权人地址: KR
- 代理机构: Innovation Counsel LLP
- 优先权: KR10-2011-0057937 20110615
- 主分类号: H01L21/302
- IPC分类号: H01L21/302
摘要:
A method of forming a metal pattern on a display substrate includes blanket depositing a copper-based layer having a thickness between about 1,500 Å and about 5,500 Å on a base substrate, and forming a patterned photoresist layer on the copper-based layer. The copper-based layer is over-etched by an etching composition containing an oxidizing moderating agent where the over-etch factor is between about 40% and about 200% while using the patterned photoresist layer as an etch stopping layer, and where the etching composition includes ammonium persulfate between about 0.1% by weight and about 50% by weight, includes an azole-based compound between about 0.01% by weight and about 5% by weight and a remainder of water. Thus, reliability of the metal pattern and that of manufacturing a display substrate may be improved.