公开(公告)号：US09133550B2

公开(公告)日：2015-09-15

申请号：US13433013

申请日：2012-03-28

申请人： In-Bae Kim ,  Jong-Hyun Choung ,  Ji-Young Park ,  Seon-Il Kim ,  Jae-Woo Jeong ,  Sang Gab Kim ,  Sang-Woo Kim ,  Ki-Beom Lee ,  Dae-Woo Lee ,  Sam-Young Cho

发明人： In-Bae Kim ,  Jong-Hyun Choung ,  Ji-Young Park ,  Seon-Il Kim ,  Jae-Woo Jeong ,  Sang Gab Kim ,  Sang-Woo Kim ,  Ki-Beom Lee ,  Dae-Woo Lee ,  Sam-Young Cho

IPC分类号： C09K13/00 ,  C23F1/18 ,  C23F1/26 ,  H01L21/3213 ,  C09K13/08 ,  H01L27/12

CPC分类号： C23F1/18 ,  C09K13/08 ,  C23F1/26 ,  H01L21/32134 ,  H01L27/124

摘要： An etching composition, a method of forming a metal pattern using the etching composition, and a method of manufacturing a display substrate are disclosed. The etching composition includes about 0.1% by weight to about 25% by weight of ammonium persulfate, about 0.1% by weight to about 25% by weight of an organic acid, about 0.01% by weight to about 5% by weight of a chelating agent, about 0.01% by weight to about 5% by weight of a fluoride compound, about 0.01% by weight to about 5% by weight of a chloride compound, about 0.01% by weight to about 2% by weight of an azole-based compound and a remainder of water. Thus, a copper layer may be stably etched to improve a reliability of manufacturing the metal pattern and the display substrate.

摘要翻译： 公开了一种蚀刻组合物，使用该蚀刻组合物形成金属图案的方法以及一种制造显示衬底的方法。 蚀刻组合物包含约0.1重量％至约25重量％的过硫酸铵，约0.1重量％至约25重量％的有机酸，约0.01重量％至约5重量％的螯合剂 ，约0.01重量％至约5重量％的氟化物，约0.01重量％至约5重量％的氯化物化合物，约0.01重量％至约2重量％的唑类化合物 和余下的水。 因此，可以稳定地蚀刻铜层以提高制造金属图案和显示基板的可靠性。

公开(公告)号：US20120318769A1

公开(公告)日：2012-12-20

申请号：US13406388

申请日：2012-02-27

申请人： Jong-Hyun Choung ,  Ji-Young Park ,  Seon-Il Kim ,  Sang-Gab Kim ,  In-Bae Kim ,  Jae-Woo Jeong

发明人： Jong-Hyun Choung ,  Ji-Young Park ,  Seon-Il Kim ,  Sang-Gab Kim ,  In-Bae Kim ,  Jae-Woo Jeong

IPC分类号： C23F1/00 ,  H01B13/00

CPC分类号： C23F1/18 ,  H01L21/32134 ,  H01L27/124 ,  H01L27/1288 ,  H01L29/458 ,  H01L29/66765

摘要： A method of forming a metal pattern on a display substrate includes blanket depositing a copper-based layer having a thickness between about 1,500 Å and about 5,500 Å on a base substrate, and forming a patterned photoresist layer on the copper-based layer. The copper-based layer is over-etched by an etching composition containing an oxidizing moderating agent where the over-etch factor is between about 40% and about 200% while using the patterned photoresist layer as an etch stopping layer, and where the etching composition includes ammonium persulfate between about 0.1% by weight and about 50% by weight, includes an azole-based compound between about 0.01% by weight and about 5% by weight and a remainder of water. Thus, reliability of the metal pattern and that of manufacturing a display substrate may be improved.

摘要翻译： 在显示基板上形成金属图案的方法包括：在基底基板上铺设厚度在约至约为500埃之间的铜基层，并在铜基层上形成图案化的光致抗蚀剂层。 通过含有氧化调节剂的蚀刻组合物对铜基层进行过蚀刻，其中过蚀刻因子在约40％至约200％之间，同时使用图案化的光致抗蚀剂层作为蚀刻停止层，并且其中蚀刻组合物 包括约0.1重量％至约50重量％的过硫酸铵，包括约0.01重量％至约5重量％的唑类化合物和剩余的水。 因此，可以提高金属图案的可靠性和制造显示基板的可靠性。

公开(公告)号：US08765614B2

公开(公告)日：2014-07-01

申请号：US13406388

申请日：2012-02-27

申请人： Jong-Hyun Choung ,  Ji-Young Park ,  Seon-Il Kim ,  Sang-Gab Kim ,  In-Bae Kim ,  Jae-Woo Jeong

发明人： Jong-Hyun Choung ,  Ji-Young Park ,  Seon-Il Kim ,  Sang-Gab Kim ,  In-Bae Kim ,  Jae-Woo Jeong

IPC分类号： H01L21/302

CPC分类号： C23F1/18 ,  H01L21/32134 ,  H01L27/124 ,  H01L27/1288 ,  H01L29/458 ,  H01L29/66765

摘要： A method of forming a metal pattern on a display substrate includes blanket depositing a copper-based layer having a thickness between about 1,500 Å and about 5,500 Å on a base substrate, and forming a patterned photoresist layer on the copper-based layer. The copper-based layer is over-etched by an etching composition containing an oxidizing moderating agent where the over-etch factor is between about 40% and about 200% while using the patterned photoresist layer as an etch stopping layer, and where the etching composition includes ammonium persulfate between about 0.1% by weight and about 50% by weight, includes an azole-based compound between about 0.01% by weight and about 5% by weight and a remainder of water. Thus, reliability of the metal pattern and that of manufacturing a display substrate may be improved.

摘要翻译： 在显示基板上形成金属图案的方法包括：在基底基板上铺设厚度在约至约为500埃之间的铜基层，并在铜基层上形成图案化的光致抗蚀剂层。 通过含有氧化调节剂的蚀刻组合物对铜基层进行过蚀刻，其中过蚀刻因子在约40％至约200％之间，同时使用图案化的光致抗蚀剂层作为蚀刻停止层，并且其中蚀刻组合物 包括约0.1重量％至约50重量％的过硫酸铵，包括约0.01重量％至约5重量％的唑类化合物和剩余的水。 因此，可以提高金属图案的可靠性和制造显示基板的可靠性。

公开(公告)号：US07418041B2

公开(公告)日：2008-08-26

申请号：US10630216

申请日：2003-07-30

申请人： Ki-Ho Jung ,  Heung-Gyooun Ryu ,  Sung-Ryul Yun ,  Byoung-II Jin ,  In-Bae Kim

发明人： Ki-Ho Jung ,  Heung-Gyooun Ryu ,  Sung-Ryul Yun ,  Byoung-II Jin ,  In-Bae Kim

IPC分类号： H04K1/10

CPC分类号： H04L27/2617

摘要： A block coding apparatus and method in an OFDM mobile communication system are provided. They reduce PAPR to 3 dB or less, while increasing a traditional block coding rate by twice, by use of complementary sequences. Therefore, spectral efficiency is improved by twice, maintaining the traditional error correction capability, and thus decoding is facilitated.

摘要翻译： 提供了一种OFDM移动通信系统中的块编码装置和方法。 它们通过使用互补序列将PAPR降低到3dB以下，同时将传统的块编码率提高了两倍。 因此，频谱效率提高了两倍，保持了传统的纠错能力，从而便于解码。

公开(公告)号：US07319723B2

公开(公告)日：2008-01-15

申请号：US10290950

申请日：2002-11-08

申请人： Ki-Ho Jung ,  Heung-Gyoon Ryu ,  In-Bae Kim ,  Byoung-Il Jin

发明人： Ki-Ho Jung ,  Heung-Gyoon Ryu ,  In-Bae Kim ,  Byoung-Il Jin

IPC分类号： H04L25/49 ,  H04L25/03

CPC分类号： H04L27/2614

摘要： Disclosed is an apparatus and method for reducing a peak-to-average power ratio (PAPR) due to multiple subcarriers in an OFDM (Orthogonal Frequency Division Multiplexing) mobile communication system. In the OFDM mobile communication system, a transmitter pre-emphasizes an output signal of an IFFT (Inverse Fast Fourier Transform) block, and a receiver de-emphasizes a received signal before FFT (Fast Fourier Transform), thereby efficiently reducing PAPR due to multiple subcarriers.

摘要翻译： 公开了一种用于在OFDM（正交频分复用）移动通信系统中减少由于多个子载波引起的峰均功率比（PAPR）的装置和方法。 在OFDM移动通信系统中，发射机预加强IFFT（快速傅里叶逆变换）块的输出信号，接收机在FFT（快速傅里叶变换）之前对接收信号进行去加强强调，从而有效地减少由于多个 副载波。