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发明授权
US08771917B2 Monomers, polymers, photoresist compositions and methods of forming photolithographic patterns 有权
单体，聚合物，光致抗蚀剂组合物和形成光刻图案的方法

Monomers, polymers, photoresist compositions and methods of forming photolithographic patterns
摘要：
Provided are (meth)acrylate monomers containing acetal moieties, polymers containing a unit formed from such a monomer and photoresist compositions containing such a polymer. The monomers, polymers and photoresist compositions are useful in forming photolithographic patterns. Also provided are substrates coated with the photoresist compositions, methods of forming photolithographic patterns and electronic devices. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.
摘要（中）：

提供含有缩醛部分的（甲基）丙烯酸酯单体，含有由这种单体形成的单元的聚合物和含有这种聚合物的光致抗蚀剂组合物。 单体，聚合物和光致抗蚀剂组合物可用于形成光刻图案。 还提供了涂覆有光致抗蚀剂组合物的基材，形成光刻图案的方法和电子装置。 组合物，方法和涂覆的基材在半导体器件的制造中具有特别的适用性。

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